Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : JMAR Technologies(JMAR) -- Ignore unavailable to you. Want to Upgrade?

To: timwa who wrote (4794)	1/13/1998 4:41:00 PM
From: Starlight	Read Replies (1) \| Respond to of 9695

The added information is an excellent overview of the various lithography types. I thought this paragraph about EUV was interesting: >>>JMAR's PXS is routinely capable of producing the EUV light that will eventually be required by future EUV lithography systems. As EUV process technology matures JMAR expects to play a more active role as a supplier of high performance EUV sources. However, much process development work is required before EUV technology will approach the already demonstrated capability of current X-ray lithography technology which is the third method for producing 0.13 micron and smaller feature sizes.<<< It appears that JMAR will not only participate in X-ray litho., but also EUV (although at a later time). I hope everyone copies the added info to disk, as it will be a good reference for the future. Betty

To: timwa who wrote (4794)	1/13/1998 4:50:00 PM
From: Bilberry	Read Replies (1) \| Respond to of 9695

Tim, thanks for the link to the JMAR page. Really nice of them to supply shareholders with this additional info, in addition to the press release. I also find it strange that DARPA said no more money past 1997 for point source, yet JMAR is getting these new moneys. How do you read that reversal of policy? --Bilberry web-ext2.darpa.mil THIS LINK SAYS THAT FUNDING FOR CERTAIN PARTS OF THE X-RAY PROGRAM FUNDING, INCLUDING POINT SOURCE WOULD END IN 1997. TODAY JMAR CONFIRMED THAT IT WILL CONTINUE TO BE FUNDED BY DARPA. STRANGE HOW THINGS WORKED OUT FOR JMAR. DARPA is working with industry and the Services to transfer those efforts having near term goals. DARPA support of proximity x-ray developments will end after the FY97 funding for mask technology and point source developments. Cross cutting issues (mask writing, inspection, repair, and stage control) will be completed in FY98.