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Technology Stocks : KLA-Tencor Corporation (KLAC) -- Ignore unavailable to you. Want to Upgrade?

To: Teri Skogerboe who wrote (911)	1/28/1998 4:22:00 PM
From: Maya	Read Replies (1) \| Respond to of 1779

PR from KLAC: Wednesday January 28, 4:00 pm Eastern Time Company Press Release KLA-Tencor's SEM Technology for Critical Dimension Measurement and Advanced Defect Inspection Selected by Texas Instruments 8100XP and SEMSpec Systems to be Installed at New Advanced Process Development Center SAN JOSE, Calif.--(BUSINESS WIRE)--Jan. 28, 1998-- KLA-Tencor Corp. (NASDAQ:KLAC - news) today announced Texas Instruments (TI) has chosen its 8100 critical dimension scanning electron microscopy (CD SEM) technology for process control applications in the development of 0.25 micron and smaller advanced integrated circuits (ICs), as well as ordered a new fully automated SEMSpec 2702 wafer inspection system. TI's choice of the 8100 CD SEM technology resulted in a order for multiple 8100XP CD SEMs and upgrade packages for those 8100 systems already in use at TI's newest research facility, the Jack Kilby Center (KFAB), Dallas, Texas. The SEMSpec will be used in KFAB, initially for advanced process technology development, and later to speed technology transfer to other TI fabs. KFAB is responsible for development and fan-out of new processes to TI fabs and joint ventures worldwide. In addition to the SEM-based products, TI also purchased other KLA-Tencor systems for use at KFAB, including: defect inspection systems for reticles, patterned wafers and unpatterned wafers; defect review and analysis systems; overlay metrology systems; and thin film measurement systems. ''Our selection of KLA-Tencor's 8100XP CD SEM was the result of a rigorous selection process conducted by a team representing our research, technology transfer and manufacturing organizations,'' stated Dale Harbison, vice president of the Semiconductor Group in TI's Manufacturing Science and Technology Center. ''One of the key factors in our selection was the ease with which the 8100 series can be integrated into new processes. The system's high level of productivity in advanced applications will be important as we anticipate fanning out the 8100 technology to our manufacturing applications worldwide.'' Harbison continued, ''We selected the SEMSpec because we believe its ability to detect difficult-to-find electrical defects, and those which are too small to be seen optically, will help to substantially accelerate our new process development and speed the transfer of new technology to manufacturing.'' TI plans to initially use the KLA-Tencor CD SEMs for deep ultra-violet (DUV) stepper qualification and advanced process control. The 8100XP CD SEM performs fully automated cassette-to-cassette CD measurements on silicon wafers and reticles. Its unique electron optical design allows bottom imaging of high aspect ratio structures and precise measurements for tight process control. The 2702 SEMSpec system is a fully automated SEM-based inspection tool capable of detecting yield-limiting material and electrical defects undetectable by other inspection tools. Prior to SEMSpec, fabs could only detect these optically invisible defects using time-consuming electrical probe test methodologies. SEMSpec's electron-optical design, with a scanning speed several thousand times faster than traditional SEM technologies, provides defect engineers with critical defect information. About KLA-Tencor: KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. An S&P 500 company, KLA-Tencor is traded on the NASDAQ National Market under the symbol KLAC. Additional information about the company is available on the Internet at www.kla-tencor.com. Contact: KLA-Tencor Corp. Roberta Emerson, 408/875-4200 or MCA, Inc. Chris Castillo, 650/968-8900