To: Q. who wrote (1825 ) 2/18/1998 5:41:00 PM From: Ian@SI Read Replies (1) | Respond to of 5867
Perhaps, this PR helps explain LRCX's relative strength this week ...biz.yahoo.com Company Press Release Lam Research Corp. Introduces Teres -- A Dry In/Dry Out, Multi Station, Integrated CMP System FREMONT, Calif.--(BUSINESS WIRE)--Feb. 18, 1998-- Linear Planarization Technology(TM) solves existing pattern density effects, dishing and erosion problems of conventional polishing technologies and provides a 3:1 planarization efficiency advantage Lam Research Corp. (NASDAQ:LRCX - news), a leading supplier of wafer fabrication equipment to the worldwide semiconductor industry, today announced a high-performance, high-productivity chemical mechanical planarization (CMP) solution. The Teres(TM) system utilizes Lam's innovative Linear Planarization Technology(TM) (LPT), which provides a 3:1 planarization efficiency advantage over conventional methods. LPT's demonstrated superior performance solves current pattern density effects, dishing and erosion problems common to competing CMP technologies. Until now, these problems have significantly limited results on critical CMP steps including shallow trench isolation and copper damascene applications. Teres performance advantages include superior planarization uniformity, the largest planarization distance, and high removal rates. LPT is the only technology that decouples removal rate, planarity, and uniformity for independent control of key parameters which enables greater process repeatability and allows for a wider process margin. Key benefits of the Teres CMP system include the ability to minimize defect density by preventing drying of slurry residues on wafer surfaces. It also eliminates potential contamination caused by moving wet wafers to a separate post-clean system. ...