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To: semi_infinite who wrote (14982)	2/24/1998 9:29:00 AM
From: BillyG	Read Replies (1) \| Respond to of 25960

SAMSUNG ELECTRONICS ALLOWED TO EXPAND DRAM CHIP PLANT SEOUL - Samsung Electronics Co has been allowed to expand its high-tech chip production plant in Kihung, Kyonggi Province, to produce 256 megabit DRAM and 1 giga DRAM chips. The government decided to give the green light to the electronics firm to expand the current plant site by up to 50 percent to install the production facilities for these semiconductor chips.

To: semi_infinite who wrote (14982)	2/24/1998 9:44:00 AM
From: BillyG	Read Replies (2) \| Respond to of 25960

Commercial availability of 193 nanometer photoresists.......... techweb.cmp.com A service of Semiconductor Business News, CMP Media Inc. Story posted at 7:30 a.m. EST/4:30 a.m. PST, 2/24/98 193-nm photoresists to arrive soon By Jack Robertson SANTA CLARA, Calif. -- Photoresists for 193-nanometer wavelength lithography systems should be commercially available by the end of 1998 -- a year before the next-generation excimer laser itself is ready for test pilot lines, according to presentations at SPIE Microlithogrpahy Conference here on Monday. Indeed, the first production use of 193-nm resists will be as retrofits into current 248-nm systems, according to Robert Allen, head of 193-nmeter lithography at IBM Corp.'s Almaden Research Center in nearby San Jose. "The new 193-nm resists are showing such high transparency and improved etch resistance that they can immediate increase the performance of existing 248-nm lithography system," Allen said. The IBM manager said he expected a variety of proprietary 193-nm resists to come on the market, with chip makers able to choose from a number of different products. He also expects some of the new resists may prove to be optimum for different parts of wafer processing. "Some may be better for vias, while others may be best for feature sizes or interconnect," Allen added. Among the new 193-nm resist materials are: Cyclic Olefin, which IBM is developing with B. F. Goodrich; attenuating copolymers being pursued by Olin Corp. and Lucent Technologies; Cyclopolymers backed by Hitachi; and bilayer resist from Olin; and acrylic resists being developed by Fujitsu. IBM's Allen said single layer resists are still preferred by most chip makers, although as the industry moves to smaller and smaller feature size dimensions, bilayer resists may be required.