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To: shane forbes who wrote (10293)	3/1/1998 12:57:00 AM
From: Duane L. Olson	Read Replies (1) \| Respond to of 25814

Wizard..thanks for straightening it all out again... //OT// That UT test report was a godsend for DPMI it seems to me... They were looking at a possible finite life for photomasks beyond .13 Micron. Now, it appears that conventional lith methodology will carry considerably further...much more than enough time for DPMI to get right in the middle of whatever followon technologies appear likely..and DPMI is heavily involved, with others, in R&D to assure a strong role when new methodologies are required. The reason I liked that note from the test members was that they confirm that a faster move to .08 micron is possible..as a certain Wizard suggested in some sleep-deprived musings.<g>... I like it it! And I hope the whole process DOES speed up... As pointed out by The Wiz, LSI could benefit... TSO