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Technology Stocks : General Lithography -- Ignore unavailable to you. Want to Upgrade?

To: Crossy who wrote (822)	3/2/1998 10:11:00 PM
From: TI2, TechInvestorToo	Respond to of 1305

Sorry, the two topics are not related. Nano is talking about the x, y dimension on wafers with multiple layers on an opaque substrate (metrology). The DuPont guy is talking about identifying defects (defect detection) that block light on the transmission of the light thru multiple transparent layers on a transparent substrate- the reticle. He makes a specific point that part of his problem is that the inspectiion tool does not inspect at the same wavelength that their customer will use the mask. It sounds like he is sending a message (to KLAC?) to give him a new technology. BTW KLAC showed results of new I line system recently my contacts report. While its not 193, or even 248 wavelength, at least it is a step in the right direction away from G line! TI2