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To: Tulvio Durand who wrote (15339)3/3/1998 3:42:00 PM
From: FJB  Respond to of 25960
 
Tulvio,

Yes, more power, better dosage control, better bandwith and EVERY other parameter important to microlithography has been improved. Seriously.

Important points:
from the Q4 CC
I'll keep my remarks here principally to the Orion, but the Orion is a 2 kilohertz 20 watt average-power machine,...

from the Q3 CC
those two critical technologies go by the name of pulse-stretching and also multi-kilohertz operation. Pulse-stretching allows one to tailor the pulse of the laser to achieve optimal lifetime for the optics train by minimizing damage to optical material. And multi-kilohertz operation of course provides extra throughput, and extra precision in dosage control for both steppers and especially for the next-generation of scanners.

There is a useful table on this page which summarizes performance parameters and what they effect. Find the table called, Table 1 Laser Performance Parameter (and their impact on stepper/scanner) measured during tests.
cymer.com

Bob