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Technology Stocks : Cymer (CYMI) NEWS ONLY! -- Ignore unavailable to you. Want to Upgrade?

To: Mr. Aloha who wrote (433)	3/5/1998 4:59:00 PM
From: Bryan Steffen	Respond to of 582

How about these apples!!! ------------------------- Cymer's Laser Used in Startling Chip AdvanceReported by the University of Texas Research Team March 5, 1998 02:59 PM SAN DIEGO--(BUSINESS WIRE)--March 5, 1998--Cymer Inc. CYMI , the world's leading supplier of the excimer laser illumination sources essential for deep ultraviolet (DUV) photolithography, today announced that its next-generation argon fluoride (ArF) excimer laser was the DUV illumination source used to achieve the breakthrough 0.08 micron design rules recently reported by the University of Texas at Austin. These atomic level feature sizes, which are just 320 atoms wide or less than 1/25,000 of an inch, could enable the production of integrated circuits (ICs) that are up to 60 percent smaller than the size of today's most sophisticated microprocessors with between 10 to 100 times the performance. Many experts agree that this poses staggering potential for the faster, smaller, higher performing chips end-users seek at increasingly lower costs. The University of Texas graduate research team's breakthrough was made possible through advances in several key areas. DuPont Photomasks Inc. (DPI) provided an etched quartz phase shift photomask, which contained the precision images of the features to be patterned on the wafer. The University of Texas created a new photoresist chemical combination, an amorphous polyolefin, that interacted with the laser light source to pattern the image. This new photoresist, which took over three years to develop, was designed to work specifically with Integrated Solutions Inc.'s (ISI) DUV ArF MicroStep(TM) 193 nm wafer stepper. The ISI wafer stepper features Cymer's next-generation ArF laser, thus enabling the extendibility of DUV lithography to address manufacturing requirements through the next decade. The project was funded through SEMATECH, a non-profit research consortium of 10 leading semiconductor manufacturers. Cymer's President and Chief Executive Officer Robert Akins noted: "Cymer's role in enabling this revolutionary IC advance further validates the strength and longevity of our illumination source technology. The combination of advanced mask making strategies, a new photoresist recipe, an advanced 193 nm DUV stepper and Cymer's leading ArF laser source has the potential to extend existing DUV optical lithography as a viable and cost-effective imaging solution well into the next century." Akins added that the laser used in the research project represents the company's shortest wavelength laser technology to date. Building upon Cymer's production-proven krypton fluoride (KrF) technology, the ArF illumination source offers the resolution, depth of focus and critical dimension control needed to image patterns down to 0.10 micron and below. Currently, Cymer maintains over an 80 percent share of the excimer laser market, with over 230 KrF lasers in production at almost all major chipmaking labs worldwide. To ensure its continued market leadership in the laser arena, Cymer is developing a suite of laser products for the full range of advanced DUV requirements, as well as future technologies for post-optical lithography strategies. Cymer Inc. is the leading provider of excimer laser illumination sources for use in deep ultraviolet (DUV) photolithography systems targeted at the pilot and production segments of the semiconductor manufacturing market. Further information on Cymer may be obtained from the company's SEC filings, the Internet at cymer.com or by contacting the company directly.