SI
SI
discoversearch

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor.  We ask that you disable ad blocking while on Silicon Investor in the best interests of our community.  If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.
Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?


To: Candle stick who wrote (15460)3/5/1998 3:31:00 PM
From: BillyG  Read Replies (2) | Respond to of 25960
 
CYMI press release! Should have delayed it one day...........
Don't miss the comment on post-optical technologies. This is not a one-product company!

biz.yahoo.com

Thursday March 5, 2:59 pm Eastern Time

Company Press Release

Cymer's Laser Used in Startling Chip Advance Reported by the
University of Texas Research Team

Next-Generation Laser Provides Enabling Technology for the

Production of Industry's First 0.08 Micron Devices

SAN DIEGO--(BUSINESS WIRE)--March 5, 1998--Cymer Inc. (NASDAQ/NMS:CYMI - news), the world's leading
supplier of the excimer laser illumination sources essential for deep ultraviolet (DUV) photolithography, today announced that
its next-generation argon fluoride (ArF) excimer laser was the DUV illumination source used to achieve the breakthrough 0.08
micron design rules recently reported by the University of Texas at Austin.

These atomic level feature sizes, which are just 320 atoms wide or less than 1/25,000 of an inch, could enable the production
of integrated circuits (ICs) that are up to 60 percent smaller than the size of today's most sophisticated microprocessors with
between 10 to 100 times the performance. Many experts agree that this poses staggering potential for the faster, smaller,
higher performing chips end-users seek at increasingly lower costs.

The University of Texas graduate research team's breakthrough was made possible through advances in several key areas.
DuPont Photomasks Inc. (DPI) provided an etched quartz phase shift photomask, which contained the precision images of the
features to be patterned on the wafer. The University of Texas created a new photoresist chemical combination, an amorphous
polyolefin, that interacted with the laser light source to pattern the image.

This new photoresist, which took over three years to develop, was designed to work specifically with Integrated Solutions
Inc.'s (ISI) DUV ArF MicroStep(TM) 193 nm wafer stepper. The ISI wafer stepper features Cymer's next-generation ArF
laser, thus enabling the extendibility of DUV lithography to address manufacturing requirements through the next decade.
The
project was funded through SEMATECH, a non-profit research consortium of 10 leading semiconductor manufacturers.

Cymer's President and Chief Executive Officer Robert Akins noted: ''Cymer's role in enabling this revolutionary IC advance
further validates the strength and longevity of our illumination source technology. The combination of advanced mask making
strategies, a new photoresist recipe, an advanced 193 nm DUV stepper and Cymer's leading ArF laser source has the
potential to extend existing DUV optical lithography as a viable and cost-effective imaging solution well into the next century.''


Akins added that the laser used in the research project represents the company's shortest wavelength laser technology to date.
Building upon Cymer's production-proven krypton fluoride (KrF) technology, the ArF illumination source offers the resolution,
depth of focus and critical dimension control needed to image patterns down to 0.10 micron and below. Currently, Cymer
maintains over an 80 percent share of the excimer laser market, with over 230 KrF lasers in production at almost all major
chipmaking labs worldwide. To ensure its continued market leadership in the laser arena, Cymer is developing a suite of laser
products for the full range of advanced DUV requirements, as well as future technologies for post-optical lithography
strategies.


Cymer Inc. is the leading provider of excimer laser illumination sources for use in deep ultraviolet (DUV) photolithography
systems targeted at the pilot and production segments of the semiconductor manufacturing market. Further information on
Cymer may be obtained from the company's SEC filings, the Internet at cymer.com or by contacting the company
directly.

Contact:

Cymer Inc.
Leslie Cole, 619/451-7149
or
MCA Inc.
Marie Labrie, 650/968-8900



To: Candle stick who wrote (15460)3/5/1998 3:31:00 PM
From: daleech  Respond to of 25960
 
News just came across the tape, sorry don't have time to post a link. CYMI basically printed the same story as the DPMI story with University of Texas.....



To: Candle stick who wrote (15460)3/5/1998 4:02:00 PM
From: FJB  Read Replies (1) | Respond to of 25960
 
RE:JMAR is about to begin experiencing Cymer-like growth NOW, this year, 1998...

Yeah, based on what products? Certainly not Britelight and that is the only thing that is remotely relevant to this thread. You posted their trumped up, one-time gain earnings report here. You know their sales are flat and this Britelight stuff may NEVER hit the market. You are nuts comparing this cash-starved, flat sales company to Cymer.

Quit spamming the thread with garbage! This is not the JMAR thread.

Get it?