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To: Tulvio Durand who wrote (1442)	3/5/1998 9:53:00 PM
From: Ian@SI	Read Replies (1) \| Respond to of 2946

Tulvio, re:B. Its scanning technology was also unique, permitting larger fields to be exposed with higher yields. My apology, my English was ambiguous. A stepper's light source remains fixed when exposing the wafer through the mask. The scanner actually scans across the mask. With the stepper and a large mask, distortions may occur towards the extremes of the pattern on the wafer. i.e. with the scanner the light is much closer to perpendicular at all points of the exposed pattern. with the stepper, that's not the case. The point I was attempting to make was that yields can be maintained at high levels even with large mask patterns. Hopefully, I haven't added more confusion; or more ambiguity. In summary, step and scan technology minimizes distortion effects and contributes to superiour critical dimension control. Sometimes, I suspect that I'm the only one who understands what I'm trying to say. ;-) Ian.