To: Paul Engel who wrote (50700 ) 3/18/1998 3:38:00 AM From: Yousef Read Replies (2) | Respond to of 186894
Paul, Re: "Basically, IBM's much vaunted Copper Metallization technology, with its added expense and process difficulty, is comparable in performance, at the 0.25 micron level, with Intel's Aluminum based process." I would like to add my two cents on this topic ... and ... I am more pessimistic on Intel's position with regards to Copper. M. Bohr gave a paper at the Dec '95 IEDM conference addressing the role that frontend device capacitance (gate, S/D and overlap) and backend interconnect resistance/capacitance play in determining the speed of circuits in various generations of technology (.5um, .35um, .25um, .18um ...). His calculations predicted that at roughly .25um, the interconnect delays (RC) were equal to the device capacitance delays while for each new generation (.18um, .13um ...), the interconnect delays became more and more important in actually determining the ultimate speed of a CPU. At that time, Intel decide to solve this problem by reducing the interconnect capacitance with Low K dielectric materials. This has turned out to be very difficult with many integration issues and might not be available for .18um technology. Copper damascene processing provides a number of benefits (some you have described): 1) Lower sheet resistance and thus lower resistance for small metal lines 2) Electromigration reliability issues are not a factor (unlike for Aluminum) 3) Potentially, much lower cost !!! This is due to a simpler process (no more dielectric CMP and dielectric dep gap fill issues) ... AND ... much better yield due to CMP of metal versus etching. This could be the compelling reason to go to Cu interconnect (cost/yield) Another fact is that IBM is indeed much further ahead in this technology than Intel. At .13um technology, Intel will have to use this technology to solve the technical problems #1 and #2 above. I agree that Intel will be able to hold their own on performance at .25um and even probably .18um, but they need to get seriously working on this NOW. (Inside word is that this is a very high priority now at Intel) IBM is a very serious competitor from the performance standpoint ... reviewing technical papers, IBM is Intel's equal in devices and IBM has a definite advantage in interconnect. Intel continues to have a significant advantage when it comes to high yield in volume manufacturing ... and Intel does have lower wafer/part costs at this point (.25um). It has been interesting to me to see all the companies "flocking" to IBM as a foundry. I have been stating on a number of threads (AMD, CYRIX ...) that the Far East foundries are no match for Intel's device performance at .25um ... I think this mainly explains the surge of IBM business. I wouldn't take IBM lightly ... though I am not sure how AMD, IDTI, NSM will make money contracting out the Fab'ing of their CPU's. Just my thoughts, Yousef