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To: Time Traveler who wrote (51136)3/25/1998 12:00:00 PM
From: IanBruce  Read Replies (1) | Respond to of 186894
 
John: 30% reduction in trace resistance

The resistance which copper technology reduces is only the
trace resistance! You still have the on-resistance of the
junction to worry about. Guess which is overwhelmingly
dominant? Right, the junction, not the metal trace. So that
30% reduction in trace resistance is really negligible.


Thanks for your input - this issue obviously requires some more investigation. My gut tells me the true potential may lie somewhere in between any direct benefit of copper metalization - and IBM's claim of lowered manufacturing costs using this process.

When IBM made this information public, I believe it is not
really hyping it. This company traditionally takes pride in
its technology and make it very obvious known to the world.
Remember a few years ago, IBM was bragging about how it
can deposit single atom, one at a time.


I guess you're referring to the Scanning Tunneling Microscope originally conceived by Binnig and Rohrer (Rorher?) at the IBM Research Laboratory in Zurich back in the late 1970's.

As I remember, they successfully spelled out the letters "IBM" using individual argon atoms.

Last I heard they were talking about the possibility of one day creating nanofabed devices such as single electron transistors. No, I'm not holding my breath for this.

Ian Bruce
(still in Boston)