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To: David Aegis who wrote (1560)	3/25/1998 2:01:00 PM
From: abcde_98	Respond to of 2946

Very good summation and well articulated, David Re .18u process: ASML can do this, but very very sporadically and with wastage. SVG can produce at .18u and with consistency. SVG is the worldwide leader. Source: inside the co., but don't want the person to get into any trouble. All truths. Hope this provides the answer you're lookig for in regard to .18u only with SVG customers or why non-SVG customers don't have it. And remember SVG has gone to .14u for Intel in at least one instance - I didn't ask how many times at .14u, so 1 machine at .14u is certainly not an overstatement. Unfortunately, I am now a trader in this stock since I had sold my position - source + IR agree not much happening 'til '99 so price move up likely in late '98. On E announcement day, who knows, SVG may even go up with bad results - happening to other co's, so why not SVG? If you think there's a mixed message here, you're right on that no one except experienced Elliot Wave practioners know where a stock is likely to go. Apparently some guy ____ Forrest was/is a practioner and he's in hiding/seclusion up in Canada -- a market veteran told me about that.

To: David Aegis who wrote (1560)	3/25/1998 2:48:00 PM
From: FJB	Respond to of 2946

Patent issued recently: Abstract: An illumination system having spatially separate horizontal and vertical intermediate image planes. A beam expander is used to expand a laser beam and direct the light to a lens array. A condenser projects and concentrates the light from the lens array into a spatially separate vertical and horizontal intermediate image planes. A relay re-images the spatially separate vertical and horizontal intermediate image planes at a single plane at a reticle. The image of the reticle is thereby projected onto a wafer. Width adjusting means and height adjusting means are located at the respective horizontal and vertical intermediate image planes. The zoomable beam expander is used to change the partial coherence independently in both planes without loss of light. The changeable lens array is used to independently change the two-dimensions of the field of view of the illumination system without loss of light. The physically separate horizontal and vertical intermediate image planes permits facilitating control over the vertical height and horizontal width of the desired rectangular illumination. The rectangular illumination is used to scan a reticle for projection onto a wafer as required in scanning type photolithography in the manufacture of circuits. Ex Claim Text: An illumination system for photolithography, comprising: a beam expander; a lens array following the beam expander; a condenser following the lens array, the condenser having a horizontal image plane and a vertical image plane at different spatial locations; and a relay following the condenser, whereby light entering the beam expander is directed to the lens array, imaged in two spatially separate planes by the condenser, and re-imaged in a single plane at a reticle by the relay. a single plane at a reticle by the relay. Assignee: SVG Lithography Systems, Inc. Patent Number: 5724122 Issue Date: 1998 03 03 Inventor(s): Oskotsky, Mark L.