Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : Novellus -- Ignore unavailable to you. Want to Upgrade?

To: Todd D. Wiener who wrote (1415)	3/30/1998 6:41:00 PM
From: David Lawrence	Read Replies (1) \| Respond to of 3813

SAN JOSE, Calif.--(BUSINESS WIRE)--March 30, 1998--Novellus Systems, Inc. (NASDAQ:NVLS), the productivity and innovation leader in thin film deposition technologies, today announced it has shipped the first in a series of its new Concept 3(tm) 300 mm chemical vapor deposition (CVD) systems to Semiconductor300 (Dresden, Germany). The milestone shipment of Novellus' state-of-the-art C3-SPEED(tm) system is the first 300 mm CVD system delivered to the facility. The tool will be evaluated for advanced applications requiring a variety of high quality oxide films for devices utilizing design rules from 0.25 micron down to 0.18 micron. The system was shipped following stringent factory testing performed by Semiconductor300 engineers to ensure that the new tool met both their technical and manufacturing criteria. Novellus Chairman and Chief Executive Officer Richard S. Hill said that this shipment is the first to a major chip manufacturer. "Semiconductor300 is the leading effort by semiconductor manufacturers to offer fully integrated state-of-the-art products to today's marketplace. Semiconductor300 has indicated that the C3-SPEED HDP tool is the first in a series of planned purchases from Novellus based on the Concept 3 family," noted Hill. According to Novellus Vice President of Engineering and Product Development Jeff Benzing, the company's initial offering of 300 mm CVD systems also includes the C3-SEQUEL(tm) and C3-ALTUS(tm). "All C3 systems leverage the production-proven designs of the Novellus Concept Two(tm) platform, but have been optimized for greater reliability, higher throughput, reduced defect density and improved capital productivity," said Benzing. "These design features, combined with our focus on design simplicity, have allowed us to meet the capital cost and system performance objectives initially set by the International 300 mm Initiative (I300I). Thus, we are well positioned to offer customers minimum risk in the transition from 200 mm to 300 mm volume production."