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Technology Stocks : Ultratech Stepper -- Ignore unavailable to you. Want to Upgrade?

To: Justa Werkenstiff who wrote (2403)	4/28/1998 4:13:00 PM
From: Justa Werkenstiff	Read Replies (1) \| Respond to of 3696

Limitation of ISI stepper in UT .08um breakthrough: pubs.cmpnet.com The 0.08-micron feature size achieved in the lab with the small field-size 193-nm wavelength stepper was reported in March by a joint research team fielded by Sematech and University of Texas in Austin. A year ago, the Japanese research consortium called ASET (for Association of Super-Advanced Electronics Technology) had patterned 0.07-micron line widths on a wafer at the 193-nm wavelength with the same next-generation 193-nm excimer laser from Cymer Inc., based in San Diego. While the limited field-size ISI stepper used in both experiments can't be used as a production tool, MIT is now working to achieve the same line widths with a production system. Rothschild said it is using a long-proven production tool - a full-size 22-x-32-mm field-size step-and-scan system, the SVG Lithography Micrascan-II - with the Cymer 193-nm laser. In lab tests, MIT already is obtaining 0.11-micron processing.