Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : General Lithography -- Ignore unavailable to you. Want to Upgrade?

To: Andrew Vance who wrote (985)	4/30/1998 12:17:00 AM
From: Alan Gallaspy	Respond to of 1305

Andrew: I checked out Rohm and Haas's sales for this quarter, and their Shipley division makes up just under 11% of their sales. Do you know of any other resist makers that are a "purer" play in this segment, and is it even worth looking at? Thanks, Alan

To: Andrew Vance who wrote (985)	5/10/1998 11:18:00 AM
From: MrGreenJeans	Respond to of 1305

Deep UV Lithography Index Morgan Stanley has come out with a deep UV lithography option index. Can anyone here tell me what the symbol for the index is and where it is traded or where I can find more information about the index? Thanks in Advance.

To: Andrew Vance who wrote (985)	5/11/1998 6:55:00 PM
From: nigel bates	Read Replies (1) \| Respond to of 1305

A member of the next food chain ? - TROY, Mich., May 11 /PRNewswire/ -- OSMIC Inc. announced today its selection as a commercial supplier by the Extreme Ultraviolet Lithography Limited Liability Corporation (EUV LLC). Osmic was awarded a contract for 300 reflection mask blanks to be used in developing extreme ultraviolet lithography (EUVL). This next generation lithography technology will enable production of integrated circuits (ICs) which offer orders of magnitude increase in speed and capacity over today's most advanced ICs. Osmic will use its recently installed fully automated in-line system to coat large silicon wafers with a multilayered EUV reflecting film for use as mask blanks in patterning experiments. The contract represents a portion of reflection mask blanks to be used for the EUV LLC's early R&D phase. Osmic will be working in cooperation with the EUV LLC and Virtual National Labs (VNL) to reduce particulate contamination in the multilayer coatings. Any particulate contamination will cause defects in the final ICs. Defect-free multilayer coatings are the ultimate goal for EUVL. Go for 1000 Nig