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To: TideGlider who wrote (17261)	4/30/1998 12:05:00 PM
From: BillyG	Respond to of 25960

Samsung and Hitachi will use 248nm DUV and phase shift masks for .18 micron production......... pubs.cmpnet.com <<Both Samsung and Hitachi plan to make the 256-MBit chips with 248-nanometer deep-UV lithography processes, which are currently being used to fabricate 64-Mbit DRAMs. The 248-nm exposure tools will produce 0.18-micron device feature sizes using new phase-shift masks. The phase-shift masks must still be qualified for production, and initially will be in very limited supply in the market. >>