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Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: Proud_Infidel who wrote (19125)	5/1/1998 2:42:00 PM
From: Ian@SI	Read Replies (1) \| Respond to of 70976

That makes it unanimous. Everyone agrees that the rest of the year is unlikely to set any records, but, at best, will be flat. I suspect that it won't be easy for most of the equipment makers to disappoint again this year. Ian.

To: Proud_Infidel who wrote (19125)	5/5/1998 9:16:00 AM
From: Neil H	Respond to of 70976

Hyundai Selects Applied Materials' CVD Dielectric ARC Technology CVD Dielectric Anti-Reflective Coating Process Installed at Hyundai for 64Mb Production SANTA CLARA, Calif.--(BUSINESS WIRE)--May 5, 1998--Hyundai has chosen Applied Materials' CVD Dielectric Anti-Reflective Coating (DARC(TM)) process technology for its 64Mb DRAM manufacturing. Multiple DxZ(TM) Centura(R) systems with CVD DARC technology have been installed in Hyundai's high-volume production line Fab 6 in Ichon, South Korea. D.S. Choi, Hyundai's Process Manager, said, ''CVD Dielectric ARC films have proven to be highly compatible with both i-line and Deep UV lithography, eliminating unwanted reflections from polysilicon and tungsten silicide surfaces. Compared to other methods, Applied Materials' in situ multi-layer CVD DARC technology is technically superior, offering the critical dimension control necessary for our most advanced, 0.25-micron memory devices, with extendibility to additional future device generations.'' As the global market leader in dielectric and metal CVD, Applied Materials introduced the industry's first CVD DARC technology in 1996 and has continued to lead the market in this fast-growing application. The highly conformal nature of this silane-based film overcomes the uniformity limitations of spin-on organic films by depositing a consistent thickness over wafer topography across the entire wafer surface. The unique single-wafer CVD chamber design enables the elimination of backside particles and provides outstanding uniformity with highly repeatable optical parameters (refractive index and extinction coefficient). These properties improve pattern transfer yields by maintaining tight critical dimension (CD) control and a uniform exposure dose over a wide range of photoresist thicknesses. Furthermore, the flexible DARC process can easily be optimized for different lithography wavelengths and substrate reflectances. This flexibility is not possible with other commercially available ARC technologies. As device designs transition to geometries of 0.18-micron and below, the capabilities of DARC technology are expected to become even more important, including the incorporation of these films in advanced damascene applications that utilize copper as the interconnect. ''We have worked closely with Hyundai to ensure the broadest application of our DARC technology to their current and future device designs,'' said Kevin Fairbairn, general manager of Applied Materials PECVD division. ''We are pleased that our DARC technology meets Hyundai's stringent processing requirements.'' Available on the company's DxZ Centura, DxZ Optima(TM) and Precision 5000(R) DxZ single-wafer CVD platforms, Applied Materials' DARC application offers a unique combination of economic efficiency and high performance. Applied Materials' DARC process is now entering its third year in production and is currently used by more than 30 semiconductor manufacturing companies worldwide. Applied Materials, Inc. is a Fortune 500 global growth company and the world's largest supplier of wafer fabrication systems and services to the global semiconductor industry. Applied Materials is traded on the Nasdaq National Market System under the symbol, ''AMAT.'' Applied Materials' web site is appliedmaterials.com. Regards Neil