To: Katherine Derbyshire who wrote (2423 ) 5/5/1998 5:58:00 PM From: BillyG Respond to of 3696
A service of Semiconductor Business News, CMP Media Inc. Story posted at updated 5 p.m. EDT/2 p.m., PDT, 5/5/98 Ultratech to launch EUV unit for next-generation lithography By Jack Robertson WASHINGTON --Ultratech Stepper Inc. here on Wednesday plans to announce the formation of a new lithography subsidiary to develop extreme ultraviolet (EUV) exposure tools, according to industry sources. During a Washington press conference late Wednesday afternoon, Ultratech chairman and CEO Arthur W. Zafiropoulo will disclose the details of the new venture, to be called U.S. Lithography. Zafiropoulo is expected to invite other investors to join San Jose-based Ultratech in promoting EUV as a leading candidate for next-generation lithography tools. Ultratech was an original member of a U.S. EUV concept demonstration project in 1995. That effort was expanded last by Intel Corp. last year when it launched a consortium to promote EUV lithography (see story Sept. 11, 1997, story). EUV and a handful of other candidates are vying to become the leading lithography technology for 0.10-micron and below device feature sizes once after deep ultraviolet (DUV) steppers run out of steam. In addition to EU--which is also backed by some Japanese chip makers--the competing lithography candidates include X-ray, direct-write electron-beam, ion-beam projection and several different efforts to extend current optical exposure technology (see story from SBN's November 1997 publication). Silicon Valley Group Inc. has already agreed to work with Intel's Extreme Ultraviolet Limited Liability Co. consortium, according to Papken S. Der Torossian, chairman and CEO of San Jose-based SVG. Contacted before speaking at the Economic Strategy Institute Symposium in Washington today, Der Torossian said SVG would not be interested in joining Ultratech. "I'm already working with Intel on EUV," he added.