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To: Katherine Derbyshire who wrote (17417)	5/8/1998 10:07:00 AM
From: BillyG	Respond to of 25960

Applied introduces a SEM production tool for identifying defects in wafers with deep submicron geometries. pubs.cmpnet.com <<The SEMVision DR-SEM system has been designed for in-line operation inside wafer fabs, using several new imaging and material analysis techniques, said the equipment supplier. Applied said the SEMVision system is five to ten times faster than existing systems and it is capable of providing automatic defect classification with a throughput of up to 300 defects per hour.>> <<SNIP>> <<"Defect review SEMs are critically needed for yield management since they provide deep submicron resolution capability not possible with optical review tools," said Dan Vilenski, chairman of Applied Materials' Process Diagnostics and Control Product Business Group. "However, today's off-line, manual SEMs lack the production throughput and ease of use needed for extensive production applications." >>