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To: Zeev Hed who wrote (17770)	5/26/1998 1:11:00 PM
From: BillyG	Respond to of 25960

Interesting article entitled "193-nm Development Hampered by Contamination" in the May issue of Solid State Technology magazine, pp. 32-34. It says that there is a "thorny" problem with 193 nm production systems because the UV radiation causes outgassing from the resist layer, and that the outgassed material chemically bonds with the lens surfaces in the UV light. This causes distortion of the images projected through the lenses, and requires that the system be extensively cleaned..... On the upside, the article said that the resist industry should be able to "quickly refine" the resists "into production-worthy formulations." The article also said that the production of calcium flouride material for 193 nm lenses is non-trivial, and that the lens material needs to be qualified on a batch-by-batch basis. Any comments, particularly on the outgassing problem?