Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : General Lithography -- Ignore unavailable to you. Want to Upgrade?

To: FJB who wrote (1023)	5/29/1998 9:31:00 AM
From: Katherine Derbyshire	Read Replies (3) \| Respond to of 1305

Both e-beam and laser systems are capable of producing PSMs. E-beam systems have inherently higher resolution, laser systems are inherently faster, so there's a tradeoff between the two for any particular mask. To my knowledge, PSMs are not yet being used in production applications. Current production technology (0.25 micron features) is pretty close to the exposure wavelength (248 nm), so the resolution enhancements needed are relatively minor. A PSM is a two-level mask, so using PSMs is a pretty radical step that chip makers won't take until they have to. Katherine