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Politics : Formerly About Advanced Micro Devices -- Ignore unavailable to you. Want to Upgrade?

To: Paul Engel who wrote (34276)	7/12/1998 11:06:00 AM
From: Yousef	Read Replies (1) \| Respond to of 1571808

Paul, Re: "I believe Intel was working on EPI raised Source-Drain technology - perhaps you have more up to date information?" The most recent info that I have heard is that .18um processing will use "halo" (angled compensation implants) implants to reduce the "reverse short channel effects (RSCE) and In (Indium) channel implants for P-channel Vt adjusts. I know that work has been done on raised S/D using SiGe selective epitaxy, but I wasn't sure how far along this was. BTW, the .18um process will be a full 30% performance boost over .25um (just like the gain going from .35um -> .25um) ... and it will be in production volume next year, '99. Regards, Yousef