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To: Andrew Vance who wrote (14822)	7/14/1998 2:35:00 PM
From: Jeffrey S. Mitchell	Respond to of 17305

Today's Stock Swap Trivia Contest... Fill in the missing last line from this last verse of a well-know song: He's your guy when stocks go high, but beware when they start to descend; It's then that those louses go back to their spouses -- ______________________ - Jeff

To: Andrew Vance who wrote (14822)	7/14/1998 3:19:00 PM
From: Peter Speyer	Read Replies (1) \| Respond to of 17305

Here's my 5% candidate--Asia Pulp and Paper (PAP). Based purely on having followed the stock a fair amount in the last year, and the relative predictability of SE Asia markets following strong US market days. Here's my post on the new PAP thread. Sorry about this late in the day candidate, but I just realized PAP was down today. If it doesn't work, it surely is a good accidental long term hold, too. :>) 207.183.153.206

To: Andrew Vance who wrote (14822)	7/14/1998 6:33:00 PM
From: Paul Dieterich	Read Replies (1) \| Respond to of 17305

Andrew, Do you know anything about the issue of vectorscan vs. rasterscan? We had a debate going on about it late last year on the Etec thread. One of the selling points about the Ultratech Stepper's vectorscan was that it was supposed to be so much faster than Etec's rasterscan, at least in some less-complex mask-making tasks. In light of this, what do you think of today's press release? >>SAN FRANCISCO--(BUSINESS WIRE)--July 14, 1998--Etec Systems Inc. (NASDAQ:ETEC), a leader in patterning solutions for the worldwide semiconductor and electronics industries, today announced the introduction of the MEBES(R) 5000, an electron-beam raster-scan pattern generation system tested to new, more rigorous "composite" specifications, that establishes an unparalleled standard for pattern generator performance. The MEBES 5000 is featured in the Etec booth (No. 1716) at SEMICON West 98, currently taking place at the Moscone Center in San Francisco. According to Frank Abboud, vice president of product development for Etec Systems, "This product is a response to our customers' requirements for a new line of higher performance MEBES systems. We developed the MEBES 5000 system to meet the accuracy and throughput requirements of the 0.18 micron mask generation, building upon experience gained from the more than 150 MEBES systems installed worldwide. With this new system, the user retains control of the design grid, writing strategy and exposure parameters. This allows the maskmaker to optimize results for leading edge mask production as well as for mask development." Abboud continued, "We are excited about the many new features and the important benefits the MEBES 5000 brings to our customers. One of the greatest benefits of the new system is its high speed; the MEBES 5000 will allow production of complex 0.18 micron device generation masks as much as eight times faster than MEBES 4500..." Full article: biz.yahoo.com --PD