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Politics : Formerly About Advanced Micro Devices -- Ignore unavailable to you. Want to Upgrade?

To: Elmer who wrote (35262)	7/30/1998 7:03:00 AM
From: Maxwell	Read Replies (1) \| Respond to of 1572644

Elmer: <<<You have presented a hypothetical process flow which you claim to be viable, and then at the lastmoment, when pressed for facts, you hide behind a wall of secrecy. I call foul. If you couldn't backup your claims then you shouldn't have brought it up in the first place. You are not the only one on this thread who has access to proprietary information. Those others who do know better than to claim knowledge they can't backup. It is far easier to dismiss your claims as BS than to be snowed by your sudden shyness to fill in the blanks. Put up or shutup.>>> Yousef said dual damascene COULDN'T be done in 1 photolithography step and 1 etch step. I showed him that it can. You called it "a hypothetical process flow". If that is so then I must be quite smart to whip it up in a few minutes. I better go and patented it right away. The truth is that you don't work in that field and Yousef IS NOT AN EXPERT IN THAT FIELD. That is a patented process and is used in production. I suggest Yousef can do his basic homework by asking his resist vendors about the technology of BI-RESIST for dual damascene. When I gave the process flow I showed that it can and has been done. There is no need for me to dwell into this discussion further. This is not a process technology thread. My suggestion for you is that you should post what you know best. What is your expertise anyway? Maxwell