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Technology Stocks : Dupont Photomasks (DPMI) -- Ignore unavailable to you. Want to Upgrade?

To: Czechsinthemail who wrote (666)	8/24/1998 11:58:00 AM
From: Rustam Tahir	Respond to of 955

DuPont Photomasks, Inc. today announced plans to install a new production line capable of producing photomasks supporting 0.25 micron design rules in its Rousset, France production facility. Expected to be operational in the fourth quarter of this year, the expansion will significantly increase DPI's ability to support its European customers' commercial production of 0.25 micron devices. DPI also announced plans to expand its cleanroom in Rousset to accommodate an entirely new production line supporting the manufacture of sophisticated photomasks used for printing 0.18 micron lines. Expansion of the cleanroom and installation of the new 0.18 micron line are expected to be completed in the second half of calendar 1999. The new enhancements at Rousset are key factors in DPI's overall strategic investments in its European infrastructure. In 1997, DPI installed a production line capable of producing photomasks supporting 0.25 micron design rules in its Rousset facility and, in May of this year, announced the formal opening of a new photomask manufacturing facility in Hamilton, Scotland. ''The installation of our second quarter-micron production line in Europe is another example of DPI's commitment to supporting our customers' demands for advanced products,'' said Gerard Cognie, executive vice president of DPI's European operations. ''Looking ahead, we anticipate our customers migration to 0.18 micron processes and are finalizing plans to expand our Rousset facility to add the next generation line capability in 1999.'' The new 0.25 micron line is anchored by a MEBES 4500S electron-beam pattern generation system produced by Etec Systems, Inc. (NASDAQ:ETEC - news) and will include the multipass gray (MPG) option allowing for high throughput of critical layer masks. The system's advanced features include special support for the production of photomasks with optical proximity correction (OPC) and phase shift features. OPC and phase shift techniques are used to provide the required depth of focus and critical dimension control necessary to fabricate semiconductor devices with deep sub-micron feature sizes. The addition of the new line will provide to DPI the flexibility to produce in Europe photomasks supporting 0.25 micron design rules with either electron beam or laser pattern generation technology. This capability will allow DPI to mix and match technologies in a way that delivers to its customers the most cost effective solutions. Photomasks are critical components in the semiconductor manufacturing process in that they are used to transfer precision images of integrated circuits onto silicon wafers. As the design rules for fabricating semiconductor devices grow progressively smaller, the challenge of producing photomasks that will enable their viable manufacture becomes increasingly complex. DPI is the world's largest photomask manufacturer, operating globally from ten strategically located facilities in North America, Europe and Asia. The company produces and supplies photomasks as well as photoblanks (photomask substrates) and pellicles (protective covers for photomasks). Headquartered in Round Rock, Texas, DPI posted worldwide sales of over $271 million in fiscal 1998. The company maintains a Web site at www.photomask.com.

To: Czechsinthemail who wrote (666)	9/5/1998 12:20:00 PM
From: D. K. G.	Read Replies (1) \| Respond to of 955

CIBC Oppenheimer positive on photomask sector CIBC Oppenheimer is optimistic about the photomask sector of the semiconductor industry, citing "compelling" valuations and fundamentals. Analysts Ali Irani, Eunhak Bae and Dongju Chung pointed out that the sector's attractiveness is in contrast to "a weak semiconductor food chain." They reiterated their "strong buy" rating on Align Rite International (MASK), with a conservative price target of $23 to $26 a share, citing the company's push into the high-growth sub-0.25-micron segment. They also maintained a "strong buy" on ETEC Systems (ETEC), with a 12-month price target of between $45 and $60, citing the company's 75 percent market share, 50 percent-plus gross margins and virtually noncyclical demand. Photronics (PLAB) was reiterated at "buy." Analysts set a price target of $24 a share. Align Rite rose 1/2 to 10 3/8. ETEC jumped 3 1/4 to close at 27 3/8. Photronics climbed 2 1/2 to 14 1/2. cbs.marketwatch.com ============================================== I'm sure DPMI has equally compelling and fundamental valuations. They get better every day !!! <gg> Regards, DKG