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To: Ibexx who wrote (62362)8/12/1998 2:31:00 AM
From: Paul Engel  Read Replies (1) | Respond to of 186894
 
Ibexx - Re: "Isn't the NIC market COMS's bread and butter? "

Yes - I guess for the "High End", that business may be "toast", as Intel "eats their lunch".

Paul



To: Ibexx who wrote (62362)8/12/1998 2:36:00 AM
From: Paul Engel  Respond to of 186894
 
Ibexx and Intel Investors - Intel gets EXCLUSIVE SVGL Wafer Stepper/Scanner for their "next generation" Photolithography - 0.15 micron feature size.

This could have major implications for Intel's technology lead and advantage over its competitors (AMD comes to mind).

The article "implies" that perhaps Merced will be built on a 0.15 micron process, and not the soon-to-be introduced 0.18 micron process.

Maybe Merced's death has been prematurely announced and greatly exaggerated

I would also guess that Intel's competitors will be whining to the Federal Government about this. Lordy, the AMD thread will be-a-buzzin' 'bout this.

Paul

{===================================}
pubs.cmpnet.com

Semiconductor Business News, c 1998, CMP Media
Inc.
August, 1998

SVGL's latest scanner to be sold
only to Intel

By Jack Robertson

SAN JOSE -- SVG Lithography is developing an advanced
step-and-scan lithography system that will be sold
exclusively to Intel Corp. The new Micrascan-IIIx could
give Intel a major boost into next-generation chips with
0.15-micron feature sizes.


Intel has become an industry leader in sub-quarter-micron
chip processing, thanks to the powerful help of lithography
tools from SVGL. Early next year, the microprocessor
vendor is expected to become one of the first chip
manufacturers to achieve large-scale production at
0.18-micron geometries.

The 0.15-micron tool will be the one that Intel likely will use
to produce critical layers for its next-generation 64-bit
Merced microprocessor, said Papken der Torossian,
chairman of SVGL's parent, Silicon Valley Group Inc. in
San Jose.

Intel has said that Merced will arrive in 2000, but hasn't
disclosed what lithography system it will use to build it.
Throughout the 1990s, SVGL has been Intel's preferred
lithography vendor for such jobs as processing critical
layers on wafers. Initially the vendor shipped the chip
maker its Micrascan-II mercury-lamp step-and-scan
systems, then later it was the deep-UV Micrascan-III.

The neat thing about the new Micrascan-IIIx is that it will
extend SVGL's deep-UV capabilities to the next-stage
0.15-micron line geometries with the same 248-nm
wavelength excimer laser system that's being used today.
The industry originally had expected that it would have to
make a major shift to the 193-nm wavelength argon
fluoride lasers in order to move to 0.15-micron feature
size. Indeed, Intel, IBM, Motorola, and Samsung all got
together and invested $10 million each in an SVGL project
to develop the Micrascan-IV using a 193-nm laser.

The new Micrascan-IIIx should enable Intel to continue its
current market strategy. The chip maker's rapid shift to
0.18-micron feature-size chips is part of a two-pronged
strategy that is constantly pushing for smaller line
geometries in order to raise the performance of high-end
Pentium microprocessors. Smaller feature sizes also
enable it to keep shrinking its MPUs to get far more die
from a single wafer. This greatly lowers the cost of
making the chip and allows Intel to meet the competition
in the more mature, low-end MPUs and still make a good
profit.

This shrink strategy also lets Intel keep its "copy exact"
fab production plan, where all of its plants essentially use
the same tools and processes.


Another advantage of the new Micrascan-IIIx, as well as
with the current Micrascan-III-plus tools, der Torossian
pointed out, was that very fine line geometries could be
done through SVGL's own optics and without the need for
extra phase shift masks. This will allow chip makers to
move more quickly to smaller feature sizes without the
extra cost and extended effort of advanced masks, he
noted. SVGL's catadioptic lenses and its reflective optics
can pattern the very small feature sizes without the need
for photomasks, he said.

Signing Intel to buy the new system will make up for the
chip maker's stretchout of a large quantity of tools it had
ordered from SVGL earlier this year, der Torossian said.
SVGL was one of many tool makers that were hurt when
Intel revised downward its 1998 capital-spending plans
and delayed new fabs in Israel and Fort Worth, Tex.

But the order delay did have a silver lining, the SVG
chairman noted. It gave SVGL a chance to court new
customers. A few sales have been made to South Korean
development fabs. In the past year, the lithography
system vendor's output was almost completely taken up
by major customers such as Intel, IBM Microelectronics,
and Motorola.

SVGL now has talks underway to sell its litho systems to
Taiwan's United Microelectronics Corp., der Torossian
said. "We now have the ability to ship tools on a timely
basis to meet their requirements," he pointed out. If SVGL
is able to sign up UMC, it would be cracking the
Taiwanese market for the first time -- a market that's long
been dominated by rival ASM Lithography of The
Netherlands.

New customers for its fab tools would also help SVGL to
fill up its huge new plant capacity. It is just now completing
a massive plant expansion. This year the Wilton, Conn.,
lithography system maker will have the capacity to build
up to 200 machines annually -- four times the number of
systems it turned out in 1997.

But the 50 machines that SVGL built last year was still
enough to exceed the 30 step-and-scan tools produced
by all its global competitors, said John Shamaly, vice
president of marketing for the parent SVG. That growing
capacity, however, could come in handy in a year or two
when demand jumps significantly as chip makers shift
rapidly to next-generation scanners.

The one fly in the ointment, as far as der Torossian is
concerned, is the falling value of the yen. He feared that
his Japanese rivals may have an unfair pricing advantage.
"They are offering extremely low prices now, partly
because of the yen advantage," he noted. "If we match
their prices, we can't get [enough of] a return on the very
large investment we have made to stay at the leading
edge of lithography technology."