Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: Backfill who wrote (19212)	8/31/1998 11:46:00 PM
From: Apple12	Respond to of 25960

I was not trying to endorse their product. It was the second time I used it free at the site. I was just posting it to give the board its results. I have never used it to make any investment decisions.

To: Backfill who wrote (19212)	9/1/1998 4:59:00 PM
From: FJB	Respond to of 25960

FYI, apparently, TI used plain old 248nm steppers and advanced masks to make prototype 0.10æm parts: Indeed, TI's lithography plan has become a critical issue in whether the company can hit its 2001 target. To do it, it intends to use next-generation 193-nm lithography tools to pattern critical dimensions in 0.10-micron ICs. TI researchers created prototypes of the 0.10-micron devices by using existing 248-nm steppers and some optical tricks. "The 193-nm systems are just now starting to become available and we expect to have one shortly, but this will not be a system that is for use in a full-flow [production] process, where you can pattern a reasonably large die," said Robert Eklund, technology development manager involved in the project at TI. He would not identify what lithography vendor would be supplying TI's initial 193-nm deep ultraviolet tool. The company plans to evaluate production systems next year. "From everything we see now, we expect the tools to be there," added Eklund, who saw no reason to believe the 0.10-micron technology will be delayed. "The product plans for customers require it and we do not see any barriers to being successful." pubs.cmpnet.com