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Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: Big Bucks who wrote (23846)	9/5/1998 9:49:00 PM
From: Katherine Derbyshire	Read Replies (3) \| Respond to of 70976

>> EUV and DUV (extreme and deep UV) lithography as well as Xray lithography and high density inductive ot transformer coupled plasma etching is hot and gaining momentum for sub 0.25uM features<< I agree with you re: etch, but beg to differ re:litho. EUV is way out. Sub-0.10 micron, if ever. X-ray is not quite as far out, maybe 0.13micron or so, but is also very much an "if" not a "when." DUV (248nm) is the thing for 0.25-0.18, with 193nm probably coming in after that. Katherine