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Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: Katherine Derbyshire who wrote (23865)9/6/1998 2:25:00 PM
From: Big Bucks  Read Replies (1) | Respond to of 70976
 
Katherine,

"I stand by my original statement that neither x-ray nor EUV is likely to be used for 0.25-0.18 micron features."

We are in agreement with this statement, my original comment was
concerning sub 0.18uM devices, but may not have been clearly stated.
In any event, there is interest in newer lithography technologies which will allow chip manufacturers to reduce feature sizes for future
chip designs.

BB


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