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To: FJB who wrote (19547)9/15/1998 3:46:00 AM
From: Czechsinthemail  Read Replies (1) | Respond to of 25960
 
Anyone care to comment on the validity of this argument:

exchange2000.com

Excerpt from ASMLF comments:

"These companies will want to shift to 193-nm
lithography to avoid the high cost of phase shift and
OPC photomasks," he believed.

The ASML executive expected that DRAM firms
would shift to 193-nm lithography to get the higher
performance possible with the greater depth of
focus and narrower beam size. But he conceded
that memory-chip producers might try to extend the
lifetime of their current 248-nm tools as long as
possible.

I'd appreciate some informed input on the relative economics of 193nm tools compared with 248nm with more advanced photomasks. It would seem to have a bearing on the relative attractiveness of the photomask companies like DPMI, PLAB and ETEC compared with the DUV lithography companies like CYMI and ASMLF. And perhaps it is relevant to the expected life of 248nm tools and how soon they are likely to be displaced by 193nm tools.

Baird