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Technology Stocks : Mattson Technology -- Ignore unavailable to you. Want to Upgrade?

To: EACarl who wrote (898)	9/21/1998 11:07:00 AM
From: Ian@SI	Read Replies (1) \| Respond to of 3661

Some MTSN news. Will we see a big jump in its price? Perhaps even a whole sixteenth? ++++++++++++++++++++++++++++++ Monday September 21, 6:00 am Eastern Time Company Press Release Selete Selects Mattson Technology's 300 mm CVD Tool Japanese Consortium to Qualify 300 mm CVD Technology for Next-Generation Wafer Processing FREMONT, Calif.--(BUSINESS WIRE)--Sept. 21, 1998--Mattson Technology (Nasdaq:MTSN - news) announced today that it has installed an Aspen III CVD System at SELETE in Yokohama, Japan. With the charter to prepare its members for the move to 300mm wafer production, SELETE, a consortium of integrated circuit (IC) manufacturers in Japan, will qualify the CVD tool as part of its program of evaluating semiconductor manufacturing equipment and materials for processing 300mm wafers. Upon completion of extensive testing of potential 300mm process tools, SELETE selected the Mattson dual wafer Aspen III CVD system with throughput up to 180 wafers per hour (wph), depending on the thickness of the deposited film. The single-chamber tool will be evaluated for a variety of leading edge technologies, including dielectric ARC (antireflective coating) layers. The system deposits silane-based films -- silicon-oxynitride and silicon-nitride -- and TEOS (tetraethylorthosilicate) oxide. Mattson offers a full suite of CVD applications for passivation; IMD underlayers, low temperature capping layers, FSG, spacers and low K gapfill; PMD; TEOS hard mask using low temperature deposition; SiC deposition for etch stop and passivation; and SiO2 backseal. ''SELETE's selection of the Aspen III CVD was based on its ability to address a full suite of leading edge technologies,'' said Brad Mattson, Mattson Technology's CEO. He added, ''Our 300mm CVD equipment is designed to extend Moore's Law by providing viable process technology and productivity options applicable for multiple generations.'' Chemical vapor deposition (CVD) is the process by which insulating and conducting films are deposited on a wafer. These films are the material used to form the resistors, capacitors and transistors of an IC, in addition to forming the wiring and insulation between these components. With feature sizes continuing to decrease, CVD process equipment must meet more stringent requirements. ABOUT THE ASPEN III CVD SYSTEM The Aspen III CVD system is a fully automated plasma-enhanced chemical vapor deposition (PE CVD) system used for depositing silane-based and TEOS films on either 200mm or 300mm wafers for a variety of leading edge process applications. The system accommodates 200mm wafers without requiring modifications to the platform or the process module. The innovative system design results in the highest productivity within the smallest footprint available in 300 mm PE CVD tools. The Aspen III CVD system debuted at SEMICON/West 98, the industry's largest U.S. tradeshow, held July 13-15 at Moscone Center in San Francisco. ABOUT SELETE Selete was established in February 1996 with 5.0 billion yen contributed by ten semiconductor manufacturers: Fujitsu Limited; Hitachi, Ltd.; Matsushita Electric Industrial Co., Ltd.; Mitsubishi Electric Corporation; NEC Corporation [Nasdaq:NIPNY - news]; Oki Electric Industry Co., Ltd.; Sanyo Electric Co., Ltd.; Sharp Corporation; Sony Corporation [NYSE:SNE - news]; and Toshiba Corporation. SELETE started full-fledged operations in November 1996 in a clean room-equipped research facility, on space leased from Hitachi's Production Engineering Research Laboratory in Totsuka, Yokohama, Japan. SELETE will initially focus on evaluating semiconductor manufacturing equipment and materials for processing 300mm wafers, and later move into other areas of basic future technology. Samsung recently joined the consortium, the first non-Japan based company to do so. ABOUT MATTSON TECHNOLOGY Mattson Technology Inc., is a leading supplier of semiconductor process equipment for photoresist strip, isotropic etch, chemical vapor deposition, epitaxial and rapid thermal processing. The company's products combine advanced process technology on a high productivity platform, backed by industry-leading support. Since beginning operations in 1989, the company's core vision has been to help bring productivity gains to semiconductor manufacturers worldwide. Headquartered in Fremont, the company maintains sales and support centers throughout the United States, Europe, Asia/Pacific and Japan. For more information, please contact Mattson Technology Inc., 3550 W. Warren Avenue, Fremont CA 94538. Telephone: (800) MATTSON. Fax: (510) 657-0165. Internet: www.mattson.com (http://www.mattson.com). -------------------------------------------------------------------------------- Contact: Mattson Technology Inc. Lindsey Mitobe, 510/492-6334 lmitobe@mattson.com