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To: Katherine Derbyshire who wrote (7049)9/29/1998 5:57:00 PM
From: Juniper  Read Replies (1) | Respond to of 10921
 
Katherine,
This morning I read the latest IEEE Spectrum magazine which has an article about a lithography technology that IBM refined and perhaps has made commercially viable. It involves a special photomask directly contacting the photoresist. The light wavelength they're using is 248nm, but supposedly the mask refracts light so that linewidths are printed at half or up to a quarter of the wavelength. I think IBM has demonstrated .10 micron with it. Sorry if my details are sketchy - I believe IEEE members can get the short article online at spectrum.ieee.org
Are you familiar with the technology, and could you comment on what place it might take or replace among the current processes?
Thanks -