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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: Maurice S. Green who wrote (20160)	11/10/1998 2:47:00 PM
From: blake_paterson	Read Replies (1) \| Respond to of 25960

Maurice: I think that the following excerpt from the end of your Oregonian article is key to understanding its implications for CYMI, with the last paragraph being the most telling: <<Design of the radiation source is likewise an open question. The most likely approach uses a laser to create a plasma at a metal target. The plasma emits EUV radiation. According to Andrew Hawryluk and co-authors from Ultratech Stepper (San Jose, CA), writing in the August 1997 issue of Solid State Technology, important source design issues include: efficient conversion from laser to EUV radiation; need for a high-average power laser; and need for a debris source. The first condenser lens (C1) looks directly at the source, so debris ablated from the target could degrade the optic. Art Zafiropoulo, president and CEO of Ultratech Stepper and acting president of USAL, calls control of particulates in the optics one of the most serious obstacles to EUV lithography. While this article reviews many difficulties and open questions facing EUV lithography, it's important to keep them in perspective. Post-optical lithography is not needed in production until the 100 nm generation, expected in 2006, according to the 1997 SIA Roadmap. A lot of research is needed, but the time and resources to do it seem to be available.>> The light source (radiation source) is plasma, which could be created w/ a laser (CYMI?) or, per the second article in R. Grutza's recent post, w/ an electrical charge. If the latter approach supersedes the former, who knows who would get the radiation source bznz. But remember, this technology is not a sure thing (yet), and won't get introduced for 5 - 8 years (if this article is correct). OTOT, that Intel is pushing the fed gov to license the technology, against procedure, to ASML is telling... BP