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To: Im-patient who wrote (7057)	11/25/1998 3:05:00 PM
From: Falstaff	Read Replies (1) \| Respond to of 9695

Here is some visibility on the technology road map... at sematech.org you will find very interesting stuff (ngl is for Next Generation Lithography), and links. The SIA National Technology Road Map for Semiconductors is available for $250, but you can find a lot of info without paying for the actual report. Also, I believe you can download the 1997 version of the road map in Adobe Acrobat Reader format (PDF) from this site (but I have not tried it): notes.sematech.org Elizabeth just published a message in which the cost of XRL is compared to DUV at 248 nm and 193 nm. It is important to understand that 248 nm is already being pushed to produce 180 nm features, and 193 will be pushed even farther. Though the costs may appear to be lower, inertia and resistance to change will give optical lithography more life than anyone expects. SIA has already been surprised by the speed with which manufacturers have moved to beat the "mundane" 250 nm rules now common. Their road map did not anticipate innovation keeping the 248 nm excimers in business as long as they will be. There is also the problem that as the features get smaller, the design gets much more complicated and is influenced by the physical techniques used in production. Design and production are becoming entwined, and the Electronic Design Automation (EDA) tools are lagging far behind. This may become the limiting factor in producing chips with smaller figures at acceptable costs. Please see these links for more information: intel.com semibiznews.com eetimes.com synopsys.com Hope this helps quench your thirst for more technical information. At least it will give you some starting points. Elizabeth: Thanks. I will be reviewing your post carefully.

To: Im-patient who wrote (7057)	11/25/1998 7:44:00 PM
From: Richaaard	Read Replies (1) \| Respond to of 9695

If your looking for a definitive answer as to whether XRL, EUV or other will "win", I doubt that there will be a clear cut winner. IBM is going to make XRL a success regardless. It would not surprise me to see Intel stay with DUV, go to EUV, or other. Other companies may take an entirely different tact. Does it make one better than the other, I doubt it? I think it will come down to the individual companies and we'll see several methods being used. JMO