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To: Starlight who wrote (7061)11/25/1998 2:55:00 PM
From: Starlight  Respond to of 9695
 
P.S. to the above article:

I forgot to add the text of the second group of tables that couldn't be reproduced here. It states:

Compared to DUV, XRL simplifies the process and improves process latitude. XRL throughput is based on current DUV resist; optimized x-ray resists will shorten exposure times and increase throughput.