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To: orkrious who wrote (20440)	12/14/1998 7:32:00 PM
From: Zeev Hed	Respond to of 25960

Jay, the December issue of Photonics Spectra has a short review of "Post Optical" lithography (why do they still call that "Lithography" is beyond me, lithography means writing on stones <VBG>). In any event, they cite the Scalpel as one of many approaches including EUV (which CYMI should participate in hopefully with a F(2) laser) or maybe with a free electron laser.). The other candidates are Proximity X-ray lithography, Electron-beam Direct write Lithography (through puts like in Scalpel could be quite a problem), and ion projection Lithography. Scalpel is the closest to reality right now. Zeev

To: orkrious who wrote (20440)	12/14/1998 8:54:00 PM
From: FJB	Respond to of 25960

Jay, I think I'll reserve judgement until the actual press release. Having Applied as a manufacturer would be big for Scalpel. Which semi-manufacturers are signing up as testers is also critical. Right now, it's still a toss up for which next-generation technology will be adopted. Bob

To: orkrious who wrote (20440)	12/14/1998 9:34:00 PM
From: FJB	Respond to of 25960

On a vote for three next-generation systems, the workshop attendees added x-ray to the list. Given a choice for only a single lithography system, the group favored EUV, sources said. A Sematech spokesman said there would be no comment on the report until the consortium completed drafting its final report on the meeting. A Select Task Force of 22 members met last weekend to survey the workshop's results and the vote of the participants. It will make its own recommendations on potential next-generation lithography systems to pursue. Some sources said that panel reflected the pattern of voting by the workshop participants, at least in favoring EUV and Scalpel as the two most favored systems. semibiznews.com