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To: D.J.Smyth who wrote (20462)	12/17/1998 11:46:00 AM
From: BillyG	Read Replies (1) \| Respond to of 25960

Next Generation Lithography Workshop Recommends Two Technologies AUSTIN, Texas, Dec. 17 /PRNewswire/ -- Participants in International SEMATECH's 2nd Next Generation Lithography Workshop have recommended the consortium narrow its funding support in 1999 to two technologies: Extreme Ultraviolet (EUV) and SCALPEL. The recommendation for International SEMATECH to focus its funding efforts on the two selected technologies does not imply that development efforts in the other two technologies under consideration -- X-ray and Ion-Beam Projection Lithography (IPL) -- should stop. "One of the goals we set for the workshop was for participants to recommend where International SEMATECH should focus its funding on NGL technologies," says Gerhard Gross, International SEMATECH director of lithography. "Based on these recommendations, we will develop funding proposals to take to our Executive Steering Council early next year. However, we will also continue to track the progress of all of the technologies and will include all in any future progress reviews." International SEMATECH hopes to build global consensus for a single NGL technology choice in the year 2000. The huge cost of converting semiconductor manufacturing facilities to the new technology demands that the industry select just one. Timing for the decision is important because the transition to NGL is expected to begin in 2003. The workshop, held Dec. 7-10 in Colorado Springs, CO, involved about 110 of the world's top lithographers from semiconductor manufacturers, supplier companies and academia. Technology champions for the four technologies under consideration made half-day presentations on the progress they have made against challenges set in last year's workshop and an interim critical review earlier this year. Participants were surveyed and asked to make recommendations on which technologies International SEMATECH should concentrate its support. International SEMATECH provides funding for mask studies and development, resist studies and other activities that support the NGL technologies. Individual companies and consortia do the development of NGL exposure tools. Following the workshop, a task force of representatives from International SEMATECH member companies; tool suppliers; Japanese semiconductor manufacturers, and international consortia reviewed the materials presented in the workshop and the survey results. The major conclusions of the workshop and task force were: -- EUV has emerged as the favored technology followed by SCALPEL for next generation lithography below 90nm. -- 157nm optical technology has the most support at the 90nm node, but either enhanced 193nm optical technology or an NGL technology may be required due to the technical and timing issues of 157nm. -- It is too early to make a singular NGL decision. Although much progress has been made in 1998, there is still insufficient data to assess the formidable risks facing all technologies. -- Mask technology is the highest area of risk for all alternatives and requires increased focus, understanding, and results. International SEMATECH tentatively plans to hold a critical review on the technologies again in mid-1999 and a 3rd NGL Workshop later in the year. Lithography is the process in semiconductor manufacturing in which chip designs are projected onto silicon wafers. Optical photolithography has been the standard of the semiconductor industry for three decades, but is nearing the end of its effectiveness. Light sources with wavelengths of 193nm in combination with other design and manufacturing innovations are expected to extend optical lithography to chip feature resolutions of 0.15 microns or possibly 0.10 microns. Studies are just beginning to learn the feasibility of using 157nm to push optical lithography even beyond 0.10 microns. Based in Austin, SEMATECH is a non-profit research and development consortium of the following U.S. semiconductor manufacturers: AMD, Compaq/Digital, Hewlett-Packard, Intel, IBM, Lucent Technologies, Motorola, National Semiconductor, Rockwell Semiconductor Systems and Texas Instruments. International SEMATECH is a wholly owned subsidiary of SEMATECH. In addition to the U.S. member companies, International SEMATECH participants include: Hyundai, Philips, STMicroelectronics, Siemens and TSMC. Additional information on SEMATECH and International SEMATECH can be found at www.sematech.org.