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To: rsie who wrote (2925)12/17/1998 12:27:00 PM
From: Investor2  Read Replies (1) | Respond to of 3696
 
AUSTIN, Texas, Dec. 17 /PRNewswire/ -- Participants in International SEMATECH's 2nd Next Generation Lithography Workshop have recommended the consortium narrow its funding support in 1999 to two technologies: Extreme Ultraviolet (EUV) and SCALPEL.

Message 6875612

Best wishes,

I2