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Technology Stocks : Micron Only Forum -- Ignore unavailable to you. Want to Upgrade?

To: eabDad who wrote (42284)	1/16/1999 1:26:00 PM
From: PAinvestor	Read Replies (1) \| Respond to of 53903

Z - Koreans, Taiwanese and Japanese purchased significant numbers of DUV steppers in 97 which are installed now producing 64meg DRAM at a chip size of over 100mm2. Their NA is a 0.55 single lens type and is having difficulty producing 0.22 micron or below with high enough resolution and yields, the chip die size as a result is larger than expected at best 100mm2-80mm2. The problem is depth of focus and the use of stack capacitors with low NA steppers. Unless phase shift masks are employed (which currently on MU is doing successfully) the introduction of scanners with higher NA is what is required for Asian fabs to produce at high enough yields and chip sizes to boost profit margins. Problems with leading edge lithography is the major problem facing Asian producers currently. The Koreans in particular may supply figures that sound impressive but their numbers are indicative of perfect yields and shrinks taking place, nowhere near reality. These steppers will not be able to produce 128meg competitively and are having difficulty with 64meg PC100 CASL2. Even if this equipment purchased during is in place currently, it is not being utilized properly due to the above problems, and I would argue really not critical to chip shrink. If you disagree I would like to hear your opinion. I have to go now, but will respond further. P.S. The Taiwanese are basically foundry producers for the Japanese, their capex decisions are based on Japanese managment decisions.