Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: Curlton Latts who wrote (20701)	1/26/1999 10:56:00 AM
From: BillyG	Read Replies (1) \| Respond to of 25960

Nikon to roll e-beam system for less than 100-nm circuits (it doesn't look like a production system b/c of low throughput) eetimes.com By David Lammers EE Times (01/25/99, 6:28 p.m. EDT) TOKYO - Nikon Inc. has developed an e-beam lithography system for ICs with 100-nanometer and smaller line widths. The company is expected to announce the system Tuesday (1/26) in Japan. According to EE Times sources, Nikon worked with IBM Corp., which developed the underlying e-beam technology for use at its Burlington, Vt. mask shop. While IBM is continuing to develop the mask-making technology required for X-ray lithography, the company worked with Nikon to expand the range of process possibilities for the time when optical lithography can no longer be extended. While Sematech has decided to work on two next-generation lithography systems,-- the extreme UV (EUV) technology being supported by Intel, AMD, Motorola, and others, as well as the Scalpel system being developed at Bell Labs,-- companies are free to develop alternatives. IBM is a member of Sematech. Direct-write e-beam has the advantage of not requiring masks, however, throughput has been cited as one reason why the technology may not be practical on the factory floor.