To: Curlton Latts who wrote (20711 ) 1/27/1999 3:11:00 PM From: TechHunter Read Replies (1) | Respond to of 25960
GREAT NEWS This may be why were up. Comments?biz.yahoo.com Company Press Release SVG Announces 157nm Optical Lithography For 90nm Node, Bridging Gap for Next-Generation Lithography SVG Says Solution Fills Needed Gap to EUV as Next-Generation Technology of Choice and Claims It Will Have First System Commercialized Well Before SIA's 2007 Target Date WILTON, Conn.--(BUSINESS WIRE)--Jan. 27, 1999-- Silicon Valley Group (SVG) announced today the industry's most advanced technology roadmap for lithography, the critical enabling technology behind the microchip. Speaking at a high-level industry meeting held late last month that included representatives from leading semiconductor chipmakers and equipment and materials manufacturers, SVG declared that extreme ultraviolet (EUV) will be the next-generation lithography (NGL) of choice and claimed that the company will beat the timeline outlined in the Semiconductor Industry Association's Semiconductor Technology Roadmap by having a commercial EUV lithography system available well before 2007. ''We've taken a look at where this industry is going and concluded that 10 years from now, EUV technology will be a viable platform,'' said Dr. Dan Fleming, vice president of technology and customer support for Silicon Valley Group's Lithography Division (SVGL). ''We have demonstrated technology leadership in lithography for more than 10 years, particularly in the deep ultraviolet (DUV) scanner area and will continue to use that same leadership in EUV by fostering that technology and commercializing it for the chip industry worldwide.'' The SVGL roadmap was presented before an audience of high-level representatives of the global semiconductor industry at the International SEMATECH Next-Generation Lithography Workshop in Colorado Springs, Colo. SVGL was the only supplier and technology champion to present a comprehensive roadmap to the NGL group. Other lithography technologies in the running include SCALPEL, ion beam and X-ray. After years of research and capitalizing on its leadership in DUV technology, SVG determined that the semiconductor industry was quickly moving toward EUV and that 157nm would enable the transition. SVG expects that its 157nm program coupled with its advanced 193nm solution will offer the industry the most advanced lithography systems in the marketplace well into the new millennium. ''We believe that the 193nm technology will follow on the heels of the 248nm laser technology and will be extended down toward, but probably not reach, 100nm for general applications,'' commented John Shamaly, vice president of corporate marketing for SVG. ''Therefore, we concluded that we need to extend that optical technology another notch by building a system based at 157nm using a fluoride laser for the illumination source. We see that as the bridge to EUV in the 21st century.'' Three years ago, SVG began working with NASA, SEMATECH and Tinsley Laboratories, now a division of SVG, to develop EUV optics. In January 1998, SVG signed an agreement with the EUV Limited Liability Corp. to review and critique an engineering test stand for EUV, and to make a proposal for a beta tool in September 1999. ''In establishing itself as the leader in the race to EUV,'' Shamaly said, ''SVG has not only defined the optics for its new machines, but also has a platform strategy in place that will allow customers to more easily migrate from the earlier node technology. The platform will also aid in transitioning from SVG's own 193nm step-and-scan tool, which has been in use at Massachusetts Institute of Technology's Lincoln Laboratories since 1993. SVG's next-generation 193nm tools, developed in conjunction with a number of U.S. and Asia-based chip manufacturers, are expected to ship in early 1999. ''The platform is very synergistic with 248nm and 193nm designs, and that is reflected in our roadmap as well,'' Shamaly added. Silicon Valley Group (Nasdaq:SVGI - news) is a leading manufacturer of automated wafer processing equipment for the worldwide semiconductor industry. The company designs, manufactures and markets technically sophisticated equipment used in the primary stages of semiconductor manufacturing. Its products include photolithography exposure tools; photoresist processing equipment; oxidation, diffusion and low-pressure chemical vapor deposition processing systems; and precision optical components and systems. For more information, visitsvg.com . Contact: Silicon Valley Group (PR) Werner Rust, 408/467-5949 rustw@svg.com or Silicon Valley Group (IR) Nancy Szymanski, 408/467-5870 szymansn@svg.com or Mathews & Clark Communications Stew Chalmers, 408/736-1120 schalmers@mathewsandclark.com Keep The Faith, Craig