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To: Ian@SI who wrote (20738)	1/28/1999 3:02:00 PM
From: BillyG	Respond to of 25960

SVG 193 nm scanner............. semibiznews.com A service of Semiconductor Business News, CMP Media Inc. Story posted 12:15 p.m./9:15 a.m., PST, 1/27/99 SVG unveils 193-nm step-and-scan tool WILTON, Conn.-- Silicon Valley Group's Lithography division (SVGL) here unveiled today the first production-worthy 193-nanometer step-and-scan lithography system, along with an aggressive lithography roadmap outlining solutions for 157-nm and extreme ultraviolet lithography (EUV). The Micrascan 193 is specified at 130 nm for grouped features, with a 0.6-micron depth of focus, and achieves system-overlay performance of 45 nm. The system also has the largest field size in the industry, SVGL claimed. Coupled with SVGL's scanner technology, the third-generation Micrascan 193 enables greater depth of focus and process latitude than current 248-nm systems, the company said. These capabilities address the Semiconductor Industry Association's Technology Roadmap150-nm node and beyond with conventional binary reticles. SVGL's roadmap was presented before an audience of high-level representatives of the global semiconductor industry at the International Sematech Next-Generation Lithography Workshop in Colorado Springs, Colo. (see story in the December 1998 publication). "We've taken a look at where this industry is going and concluded that 10 years from now, EUV technology will be a viable platform," said Dan Fleming, vice president of technology and customer support for SVGL. SVGL determined that 157-nm would enable the transition. "We believe that the 193-nm technology will follow on the heels of the 248-nm laser technology and will be extended down toward, but probably not reach, 100-nm for general applications," commented John Shamaly, vice president of marketing. "Therefore, we concluded that we need to extend that optical technology another notch by building a system based at 157-nm using a fluoride laser for the illumination source. We see that as the bridge to EUV in the 21st century." Already, second-generation systems are on track for installation in early 1999, said Shamaly.