Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: Justa Werkenstiff who wrote (20776)	1/29/1999 6:48:00 PM
From: Proud_Infidel	Respond to of 25960

Competitors draw even in next-generation lithography race By Yoshiko Hara and David Lammers EE Times (01/29/99, 5:15 p.m. EDT) AUSTIN, Texas — The competition to develop a next-generation lithography solution drew nearly dead even this week, as two factions of the scanning e-beam camp and one high-profile backer of a competing extreme-ultraviolet (EUV) scheme floated announcements of broadened support. International Sematech members who gathered here this week for a scheduled meeting reserved judgment on the dueling announcements, stating that the consortium will continue to evaluate the competing approaches but that it remains concerned about "the technical risks and costs for all of the next-generation lithography technologies at and below the 70-nanometer node." eetimes.com