To: orkrious who wrote (1945 ) 1/31/1999 11:33:00 AM From: FJB Read Replies (1) | Respond to of 2946
Cymer had abandoned their F2 program, because few in the industry thought F2 was a workable solution even in mid-98. Currently, SVGL is the only company capable of building an F2 scanner, because it requires a catadioptric lens design. Of the four major lithography vendors, only SVGL is building scanners using such a design. Work at Lincoln Laboratories has indicated F2 lithography is feasible. With SVGL touting their technology, other stepper companies are also beginning or growing interested in R&D work on F2, but SVGL clearly has the lead with their experience in the required optics. I believe this has sparked interest at Cymer in F2 lasers again and they have probably restarted R&D work on those lasers. Cymer is presenting a paper on F2 lasers at the SPIE Microlithography conference in March. After I read the paper, I'll be able to tell you more about the status of Cymer's F2 program and their thoughts on the technology.Revisiting F2 laser for DUV microlithography, T. Hofmann, J. M. Hueber, P. P. Das, S. Scholler, Cymer, Inc. [3679-49] I think it is still debatable whether F2 will be used. With it's insertion point at the 0.09µm technology node in about 2004, it may overlap with EUV's introduction and will certainly overlap with extended ArF technology using PSM/OPC. 2004 is still a long ways off, so it's impossible to predict how things will develop over the next five years. I wouldn't worry about it too much right now. It's not an important issue at this point and we will see at least one downturn before 2004 and you will have cashed in your CYMI stock before that next downturn, right? :-) Bob