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To: Clarksterh who wrote (21375)3/17/1999 5:08:00 PM
From: Ian@SI  Read Replies (1) | Respond to of 25960
 
Clark,

Excellent points.

I'd further observe that sometimes a company can guess wrong when attempting to leap frog too far. They may come up with a technology that isn't required while they're still viable.

Somehow JMAR comes to mind.

But LU's SCALPEL is another contender for the most unneeded improvement award.

In addition to potential optics problems with F2 lasers, I'd expect that photoresists may also present a challenge.

I believe the SIA roadmap calls for 157nm near 2010. I wouldn't be surprised to see the life of both 248nm and 193nm extended.

But time will tell. And I sure wouldn't place a bet on LP.

Ian.