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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: Curlton Latts who wrote (21551)	4/1/1999 11:32:00 AM
From: Rob C.	Respond to of 25960

News.... For Next-Generation Technologies SAN DIEGO, April 1 /PRNewswire/ -- Cymer, Inc. (Nasdaq: CYMI), the world's leading supplier of illumination sources essential for deep ultraviolet (DUV) photolithography, recently presented data from its research programs, which are developing light source solutions for current and next-generation lithography requirements. Data on Cymer's deep ultraviolet (DUV) light sources at 248 nm, 193 nm, and 157 nm as well as its extreme ultraviolet (EUV) nm light source at 13.5 nm was presented at SPIE's 24th International Symposium on Microlithography. Progress in developing next-generation wavelength tools was achieved utilizing similar versions of Cymer's patented Solid State Pulse Power Module (SSPPM), which has demonstrated production-proven technology at over 600 installations around the world. Cymer's paper titled "Production Ready 2kHz KrF Excimer Laser for DUV Lithography" demonstrates that higher repetition rates at 248 nm have a positive impact on wafer throughput. Life tests at 2kHz show that the system's core module lifetimes far exceed present day 1kHz lifetimes. The second 248 nm paper "Novel Metrology for Measuring Spectral Purity of KrF Lasers for DUV Lithography" explores the challenges of accurately measuring spectrum shape. The growing use of higher numerical aperture (NA) lenses for 248 nm lithography systems sets tight requirements on the spectral purity of the laser. The 95 percent spectral energy integral measurement that has become the new standard over the past year provides the lithographer with a more accurate measure of the laser's spectral purity during exposure and process optimization. Cymer has filed a patent for its compact double-pass etalon spectrometer that provides this essential energy integral measurement as well as the traditional Full-Width-at-Half-Maximum (FWHM) measurement. "Performance Characteristics of Ultra-Narrow ArF Laser for DUV Lithography" highlights Cymer's 193 nm developments in enabling higher NA lithography tools that are instrumental in imaging narrower line widths. Through design enhancements to its current line-narrowing technology, Cymer has been able to reduce the bandwidth of a 193 nm laser down to 0.8 pm 95 percent energy integral and 0.3 pm FWHM. This performance may allow lithography tool manufacturers to reduce their cost of operation by greatly diminishing the amount of costly calcium fluoride (CaF2) used in 193 nm imaging lenses and improve resolution by enabling their use of higher NA lenses. "Revisiting F2 Laser for DUV Microlithography" details Cymer's technology innovations from its 157 nm fluorine molecular laser program. Cymer's vice president of applied technology Palash Das stated, "We have demonstrated a 2000 Hz repetition rate at 157 nm by designing the system with the same solid state pulse power module and chamber technologies used in our 248 nm and 193 nm lasers." Data presented showed that the basic stability and beam properties of the 157 nm laser are similar to Cymer's 193 nm ArF laser. "EUV (13.5nm) Light Generation Using a Dense Plasma Focus Device" unveils Cymer's newest prototype, a patented dense plasma focus (DPF) device that produces narrow-band radiation at 13.5 nm and is capable of high repetition rate operation. Cymer believes its technology provides a simpler and more scalable approach to EUV light generation than other EUV technologies currently under development. Cymer, Inc. is the world's leading supplier of excimer laser illumination sources, the essential light source for deep ultraviolet (DUV) photolithography systems. DUV lithography is a key enabling technology, which has allowed the semiconductor industry to meet the exact specifications and manufacturing requirements for volume production of today's advanced semiconductor chips. Further information on Cymer may be obtained from the Company's SEC filings, the Internet at cymer.com or by contacting the Company directly. SOURCE Cymer, Inc. -0- 04/01/99 /CONTACT: Marie Burke, Director, Investor Relations, 619-618-5232, fax, 619-618-3090, or Leslie Cole, Sr. Corp. Communications Manager, 619-451-7149, fax, 619-618-3035, both of Cymer, Inc.; or Dori Jones, Account Manager of MCA, Inc., 650-968-8900, fax, 650-968-8990/ /Web site: cymer.com (CYMI) CO: Cymer, Inc. ST: California IN: CPR SU: PQ-SF -- LATH005A -- 2666 04/01/99 11:00 EST prnewswire.com //Begin Meta Data// Selector Code: .7b6c Copyright 1999, PR Newswire