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To: Demosthenes who wrote (3126)	4/5/1999 1:09:00 AM
From: Katherine Derbyshire	Read Replies (1) \| Respond to of 3696

Based on the abstract, it looks like a fairly broad method for laser-annealed contacts. Laser annealing is, theoretically at least, the way to go for many thermal processes. It allows more precise control of heating times, and has less impact on the rest of the wafer. Self-aligned contacts are very good because they reduce the number of lithography steps. That reduces costs and improves yield. Whether it's a home run will depend (as with most inventions) more on implementation and marketing than on theory. (Disclaimer: I've only read the abstract, and I am not a patent lawyer.) I was going to suggest earlier that IP issues might be part of the reason for lackluster marketing of PGILD. This patent tends to confirm that. Katherine