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To: orkrious who wrote (21682)	4/14/1999 11:51:00 AM
From: Proud_Infidel	Read Replies (2) \| Respond to of 25960

German consortium to develop optics for 157-nm lithography system A service of Semiconductor Business News, CMP Media Inc. Story posted 9 a.m. EST/6 a.m., PST, 4/14/99 By Jack Robertson MUNICH -- Carl Zeiss GmbH will lead a German consortium to develop the optical infrastructure for a 157-nm lithography system capable of fabricating 0.07-micron chip generation, the firm announced at SEMI Semicon Europa show here. The three-year $27 million program Is funded by the German Ministry of Education and Research. Zeiss, based in Oberkochen, will lead the consortium and be responsible for the 157-nm calcium fluoride lens. Consortium members include Schott ML, of Jena, Germany, for the calcium fluoride lens material and mask blanks; W.C. Heraeus Co., of Hanau, for materal; Infineon Technologies (foremrly Siemens Semiconductors) for mask processing and photoresist; and Jenoptik Infab, based in Jena, for beam delivery. ASM Lithography will supply the platform scanner, and Lambda Physik provides the 157-nm F2 laser. Echoing others at Semicon Europa, Herman Gerlinger, executive vice president and general manager of the Zeiss Semiconductor Technology Group, said 157-nm scanners can extend optical lithography down to the 0.07-micron feature size, and perhaps even lower with optical enhancements (see April 13 story). He expected the first complete 157-nm exposure tools from the consortium to be available in 2002 with production shipments starting in late 2004 or early 2005. The German 157-nm initiative follows a U.S. development by SVG Lithography, of Wilton, Conn., and a Japanese 157-nm program being put together by the Selete consortium. The U.S.'s Sematech consortium is also planning to support 157-nm infrastructure development.