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Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?


To: Drake who wrote (29888)5/3/1999 10:26:00 AM
From: Ian@SI  Respond to of 70976
 
Drake,

Using a stepper from UTEK (which they picked up when they bought ISI last year) and using Phase Shift Masks, LU has been able to create a single working cell with feature sizes as small as 0.08µ.

This is closer to basic research than it is to the production fab floor.

I doubt that there will be any impact whatsoever in the next five years.

It probably just means that optical lithography will live another 5 years longer than planned.

FWIW,
Ian.